n&k Technology, Inc., of San Jose, California, was founded in 1992 by Drs. Rahim Forouhi
and Iris Bloomer. The company manufactures exceptionally high resolution, state-of-the-art
scatterometry (OCD) and thin film metrology tools for the semiconductor, photomask, data
storage, flat panel display and solar cell industries. n&k’s large family of tools provide measure-
ments for a large range of OCD and thin film structures that cover current and future applications,
and are used for the most challenging applications of today’s high tech industries.
n&k’s thin film measurement systems accurately and repeatably determine thicknesses, n and k
spectra and energy band gap of ultra-thin (e.g., a mono-layer of graphene) and ultra-thick films
(e.g. Epi-Si layers) comprising single-layer and multi-layer film stacks. Films can be deposited on
either rough or smooth surfaces.
n&k’s scatterometers accurately and repeatably determine depth, CD, and profiles of complex
2D (trenches) and 3D (contact holes) structures – even structures with high aspect ratios.
Pitches can be very small or large. In addition, n&k scatterometers measure ultra-thin films
incorporated on or in or lining such 2-D and 3-D structures.
The core technology is based on DUV-Vis-NIR (or IR) broadband reflectance (and transmittance
if substrate is transparent), utilizing patented reflective optics that provides optimized signal-to-
noise of the raw data. Analysis is based on the Forouhi-Bloomer Dispersion Equations for n and
k of thin films, combined with Rigorous Coupled Wave Analysis for OCD structures.
n&k Technology’s scatterometers and thin film metrology tools are field-proven, production-
worthy, fast, and non-destructive, enabling process control and yield improvement of
technological devices comprising thin films, trenches, and contact holes.