Unusual scaling for pulsed laser deposition
In: Physical review letters, Jg. 87 (2001) ; Nr. 13, S. 135701 (4 pages)
ISSN: 1079-7114, 0031-9007
Zeitschriftenaufsatz / Fach: Physik
We show that a simple model for pulsed laser deposition exhibits an unusual type of scaling behavior for the island density in the submonolayer regime. This quantity is studied as a function of pulse intensity and deposition time. We find a data collapse for the ratios of the logarithms of these quantities, whereas conventional scaling as observed in molecular beam epitaxy involves ratios of powers.