<s>
In	O
technology	O
,	O
soft	B-Algorithm
lithography	I-Algorithm
is	O
a	O
family	O
of	O
techniques	O
for	O
fabricating	O
or	O
replicating	O
structures	O
using	O
"	O
elastomeric	O
stamps	O
,	O
molds	O
,	O
and	O
conformable	O
photomasks	O
"	O
.	O
</s>
<s>
Soft	B-Algorithm
lithography	I-Algorithm
is	O
generally	O
used	O
to	O
construct	O
features	O
measured	O
on	O
the	O
micrometer	O
to	O
nanometer	O
scale	O
.	O
</s>
<s>
According	O
to	O
Rogers	O
and	O
Nuzzo	O
(	O
2005	O
)	O
,	O
development	O
of	O
soft	B-Algorithm
lithography	I-Algorithm
expanded	O
rapidly	O
from	O
1995	O
to	O
2005	O
.	O
</s>
<s>
Soft	B-Algorithm
lithography	I-Algorithm
tools	O
are	O
now	O
commercially	O
available	O
.	O
</s>
<s>
Soft	B-Algorithm
lithography	I-Algorithm
has	O
some	O
unique	O
advantages	O
over	O
other	O
forms	O
of	O
lithography	O
(	O
such	O
as	O
photolithography	B-Algorithm
and	O
electron	B-Architecture
beam	I-Architecture
lithography	I-Architecture
)	O
.	O
</s>
<s>
Smaller	O
details	O
than	O
photolithography	B-Algorithm
in	O
laboratory	O
settings	O
(	O
~	O
30	O
nm	O
vs	O
~	O
100nm	O
)	O
.	O
</s>
