<s>
Process	B-Algorithm
variation	I-Algorithm
is	O
the	O
naturally	O
occurring	O
variation	O
in	O
the	O
attributes	O
of	O
transistors	O
(	O
length	O
,	O
widths	O
,	O
oxide	O
thickness	O
)	O
when	O
integrated	O
circuits	O
are	O
fabricated	B-Architecture
.	O
</s>
<s>
The	O
amount	O
of	O
process	B-Algorithm
variation	I-Algorithm
becomes	O
particularly	O
pronounced	O
at	O
smaller	O
process	O
nodes	O
(	O
<	O
65nm	O
)	O
as	O
the	O
variation	O
becomes	O
a	O
larger	O
percentage	O
of	O
the	O
full	O
length	O
or	O
width	O
of	O
the	O
device	O
and	O
as	O
feature	O
sizes	O
approach	O
the	O
fundamental	O
dimensions	O
such	O
as	O
the	O
size	O
of	O
atoms	O
and	O
the	O
wavelength	O
of	O
usable	O
light	O
for	O
patterning	O
lithography	B-Algorithm
masks	O
.	O
</s>
<s>
Process	B-Algorithm
variation	I-Algorithm
causes	O
measurable	O
and	O
predictable	O
variance	O
in	O
the	O
output	O
performance	O
of	O
all	O
circuits	O
but	O
particularly	O
analog	O
circuits	O
due	O
to	O
mismatch	O
.	O
</s>
<s>
Typically	O
process	O
models	O
(	O
example	O
HSPICE	O
)	O
include	O
process	O
corners	O
based	O
on	O
Front	B-Algorithm
End	I-Algorithm
Of	I-Algorithm
Line	I-Algorithm
conditions	O
.	O
</s>
<s>
To	O
reduce	O
roughness	O
of	O
line	O
edges	O
,	O
advanced	O
lithography	B-Algorithm
techniques	O
are	O
used	O
.	O
</s>
