<s>
The	O
front-end-of-line	B-Algorithm
(	O
FEOL	B-Algorithm
)	O
is	O
the	O
first	O
portion	O
of	O
IC	B-Architecture
fabrication	I-Architecture
where	O
the	O
individual	O
components	O
(	O
transistors	B-Application
,	O
capacitors	O
,	O
resistors	O
,	O
etc	O
.	O
)	O
</s>
<s>
FEOL	B-Algorithm
generally	O
covers	O
everything	O
up	O
to	O
(	O
but	O
not	O
including	O
)	O
the	O
deposition	O
of	O
metal	O
interconnect	O
layers	O
.	O
</s>
<s>
For	O
the	O
CMOS	B-Device
process	O
,	O
FEOL	B-Algorithm
contains	O
all	O
fabrication	B-Architecture
steps	O
needed	O
to	O
form	O
isolated	O
CMOS	B-Device
elements	O
:	O
</s>
<s>
Selecting	O
the	O
type	O
of	O
wafer	B-Architecture
to	O
be	O
used	O
;	O
Chemical-mechanical	B-Algorithm
planarization	I-Algorithm
and	O
cleaning	O
of	O
the	O
wafer	B-Architecture
.	O
</s>
