<s>
Chemical	B-Algorithm
vapor	I-Algorithm
deposition	I-Algorithm
of	I-Algorithm
ruthenium	I-Algorithm
is	O
a	O
method	O
to	O
deposit	O
thin	O
layers	O
of	O
ruthenium	O
on	O
substrates	O
by	O
Chemical	B-Algorithm
vapor	I-Algorithm
deposition	I-Algorithm
(	O
CVD	O
)	O
.	O
</s>
<s>
A	O
unique	O
challenge	O
arises	O
in	O
trying	O
to	O
grow	O
impurity-free	O
films	O
of	O
a	O
catalyst	B-Device
in	O
Chemical	B-Algorithm
vapor	I-Algorithm
deposition	I-Algorithm
(	O
CVD	O
)	O
.	O
</s>
<s>
This	O
creates	O
a	O
potential	O
catalytic	O
decomposition	O
path	O
for	O
all	O
metal-organic	B-Algorithm
CVD	I-Algorithm
precursors	O
that	O
is	O
likely	O
to	O
lead	O
to	O
significant	O
carbon	O
incorporation	O
.	O
</s>
<s>
Platinum	B-Operating_System
,	O
a	O
chemically	O
similar	O
catalyst	B-Device
,	O
catalyzes	O
dehydrogenation	O
of	O
five	O
-	O
and	O
six-member	O
cyclic	O
hydrocarbons	O
into	O
benzene	O
.	O
</s>
<s>
The	O
d-bands	O
of	O
ruthenium	O
lie	O
higher	O
than	O
those	O
in	O
platinum	B-Operating_System
,	O
generally	O
predicting	O
stronger	O
ruthenium	O
–	O
adsorbate	O
bonds	O
than	O
on	O
platinum	B-Operating_System
.	O
</s>
<s>
Ruthenium	O
is	O
unusually	O
well	O
studied	O
in	O
the	O
surface	O
science	O
and	O
catalysis	O
literature	O
due	O
to	O
its	O
industrial	O
importance	O
as	O
a	O
catalyst	B-Device
.	O
</s>
<s>
Despite	O
these	O
complications	O
,	O
ruthenium	O
is	O
a	O
promising	O
candidate	O
for	O
understanding	O
chemical	B-Algorithm
vapor	I-Algorithm
deposition	I-Algorithm
and	O
precursor	O
design	O
of	O
catalytic	O
films	O
.	O
</s>
