<s>
A	O
Bubbler	B-Algorithm
cylinder	I-Algorithm
is	O
a	O
component	O
of	O
a	O
unit	O
for	O
the	O
metal	B-Algorithm
organic	I-Algorithm
chemical	I-Algorithm
vapor	I-Algorithm
deposition	I-Algorithm
(	O
MOCVD	O
)	O
.	O
</s>
<s>
They	O
are	O
devices	O
that	O
are	O
used	O
for	O
conveying	O
electronic	O
grade	O
metalorganic	O
compounds	O
from	O
a	O
liquid	O
or	O
solid	O
precursor	O
into	O
a	O
usable	O
vapor	B-Application
.	O
</s>
<s>
The	O
supply	O
of	O
the	O
often	O
expensive	O
and	O
sensitive	O
chemical	O
is	O
controlled	O
by	O
the	O
regulated	O
flow	O
of	O
inert	O
gas	O
and	O
the	O
temperature	O
of	O
the	O
bubbler	O
,	O
resulting	O
in	O
a	O
given	O
vapor	B-Application
pressure	O
of	O
the	O
chemical	O
.	O
</s>
<s>
The	O
gallium	O
is	O
introduced	O
into	O
the	O
MOVPE	O
reactor	O
chamber	O
via	O
a	O
vapor	B-Application
.	O
</s>
<s>
This	O
vapor	B-Application
is	O
generated	O
by	O
bubbling	O
an	O
inert	O
carrier	O
gas	O
(	O
such	O
as	O
nitrogen	O
or	O
argon	O
)	O
through	O
a	O
cylinder	O
with	O
a	O
dip	O
tube	O
through	O
a	O
metalorganic	O
precursor	O
,	O
such	O
as	O
trimethylgallium	O
.	O
</s>
<s>
The	O
inert	O
carrier	O
gas	O
and	O
the	O
metalorganic	O
vapor	B-Application
is	O
then	O
introduced	O
into	O
the	O
MOVPE	O
(	O
or	O
MOCVD	O
)	O
reactor	O
chamber	O
during	O
the	O
production	O
of	O
high	O
brightness	O
LEDs	O
.	O
</s>
