GEW has incorporated nitrogen into its N2 UV lamp head system for inert gas atmosphere curing of inks and coatings, and coupled the technology with its new e-Brick electronic power supply. GEW says users of the system will benefit from a 30 percent reduction in power consumption and a 20 percent boost in UV output. Inert gas atmosphere technology is used as a means of eliminating oxygen inhibition within inks or coatings, allowing a reduction of chemistry related photoinitiators. GEW has developed its system based on a sealed curing chamber built around a dedicated idler roll. Oxygen is purged from the chamber using nitrogen that is introduced in a controlled manner.