The ON Semiconductor 0.5-micron CMOS (C5) process is a non-silicided CMOS process that has 3 metal layers and 2 poly layers, and a high resistance layer. Stacked contacts are supported. The process is for 5 volt applications.
It is suitable for general mixed-signal designs and some sensor designs such as bio-instrumentation sensor or imaging sensors, and for post-processing. It is useful for signal conditioning and control circuitry in integrated microsystems.