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|Title: ||Fabrication of Diamond Membranes for MEMS using Reactive Ion Etching of Silicon|
|Authors: ||Ramesham, R.|
Ellis, C. D.
Olivas, J. D.
|Issue Date: ||Apr-1998 |
|Citation: ||Thin Solid Films|
|Abstract: ||Polycrystalline diamond thin film has been grown on a silicon substrate using high pressure microwave plasma-assisted chemical vapor deposition from a gas mixture of methane and hydrogen at a substrate temperature of 950 degrees celcius.|
|Appears in Collections:||JPL TRS 1992+|
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