Training the Model to Learn from Implicit Expression Analysis of Industrial Machine Log Files The Patent Was Developed by DeepCube, Nano Dimension's In-house Deep Learning-Based AI Group Core of Nano Dimension's Work on AI Driven Solutions for Advanced Manufacturing Systems Default Detection and Preventive Maintenance Waltham, Mass, Jan. 31, 2024 (GLOBE NEWSWIRE) -- Nano Dimension Ltd. (Nasdaq: NNDM) ("Nano Dimension" or the "Company"), a leading supplier of Additively Manufactured Electronics ("AME") and multi-dimensional polymer, metal & ceramic Additive Manufacturing ("AM") 3D printing solutions, today announced the filing of a U.S. patent application titled " Large Language Models for Efficient Anomaly Detection in Log Files of Industrial Machines " (the "Log Analysis Patent" or "Patent"), which is targeted for real-time data analysis and scalable deployment across the Company's own systems and industrial solutions provided to outside customers.